Showing 2 results for Surface Analysis
Alaee M.s.,
Volume 3, Issue 1 (6-2006)
Abstract
plasma-sprayed silicon layers have been used to produce silicon nitride layers with fibrous microstructure which optimizes fracture toughness and strength. SEM examination of the specimens shows that the surface is covered by fine needles and whiskers of Si3N4.In order to study the oxygen contamination effect as well as other contaminants introduced during spraying and nitridation processes, surface sensitive analysis techniques like AES and XPS have been used to determine concentration of these contaminants.
S. Shanmugan, D. Mutharasu,
Volume 16, Issue 2 (6-2019)
Abstract
Boron included aluminium nitride (B-AlN) thin films were synthesized on silicon (Si) substrates through chemical vapour deposition ( CVD ) at 773 K (500 °C). tert-buthylamine (tBuNH2) solution was used as nitrogen source and delivered through gas bubbler. B-AlN thin films were prepared on Si-100 substrates by varying gas mixture ratio of three precursors. The structural properties of the films were investigated by X-ray diffraction (XRD) technique and verified the formation of polycrystalline and mixed phases of hexagonal (100), & (110) oriented AlN and orthogonal (002) & cubic (333) oriented BN. The crystallite size was smaller and dislocation density was higher as the deposition was conducted with lowest total gas mixture ratio (25 sccm). Improved surface properties were detected for film deposited using lowest total gas mixture ratio and confirmed by field emission scanning electron microscope (FESEM) and atomic force microscope (AFM). The composition of films showed the existence of higher concentration of B in the film prepared using lower total gas mixture ratio and confirmed by energy dispersive X-ray Spectroscopy (EDX).
